{"id":583852,"date":"2019-02-25T10:22:53","date_gmt":"2019-02-25T14:22:53","guid":{"rendered":"http:\/\/spaceweekly.com\/?guid=24e9422637f1457e8cb159ede596d14f"},"modified":"2019-02-25T10:22:53","modified_gmt":"2019-02-25T14:22:53","slug":"sequential-infiltration-synthesis-sis-significantly-improves-euv-patterning","status":"publish","type":"post","link":"https:\/\/spaceweekly.com\/?p=583852","title":{"rendered":"Sequential infiltration synthesis (SIS) significantly improves EUV patterning"},"content":{"rendered":"<p>his week, at the SPIE Advanced Lithography conference 2019, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, demonstrates the positive impact of sequential infiltration synthesis (SIS) on the EUVL (extreme ultra-violet lithography) patterning process. This post-lithography technique is shown to significantly reduce stochastic nano-failures and line roughness, contributing to the introduction of EUVL patterning of future nodes&#8221;. This work integrates recent advancements on metrology and etch, and on material developments, which will be presented in multiple papers at this week&#8217;s 2019 SPIE Advanced Lithography Conference.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>his week, at the SPIE Advanced Lithography conference 2019, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, demonstrates the positive impact of sequential infiltration synthesis (SIS) on the EUVL (extreme &#8230;<\/p>\n","protected":false},"author":0,"featured_media":615444,"comment_status":"closed","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[],"tags":[],"class_list":["post-583852","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry"],"_links":{"self":[{"href":"https:\/\/spaceweekly.com\/index.php?rest_route=\/wp\/v2\/posts\/583852","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/spaceweekly.com\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/spaceweekly.com\/index.php?rest_route=\/wp\/v2\/types\/post"}],"replies":[{"embeddable":true,"href":"https:\/\/spaceweekly.com\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=583852"}],"version-history":[{"count":1,"href":"https:\/\/spaceweekly.com\/index.php?rest_route=\/wp\/v2\/posts\/583852\/revisions"}],"predecessor-version":[{"id":583853,"href":"https:\/\/spaceweekly.com\/index.php?rest_route=\/wp\/v2\/posts\/583852\/revisions\/583853"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/spaceweekly.com\/index.php?rest_route=\/wp\/v2\/media\/615444"}],"wp:attachment":[{"href":"https:\/\/spaceweekly.com\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=583852"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/spaceweekly.com\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=583852"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/spaceweekly.com\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=583852"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}