Laser damage in fused silica, particularly ultraviolet laser damage, is still a key problem limiting the development of high-power laser systems. The traditional processing method of fused silica goes through the processes of grinding and chemical mechanical polishing (CMP). This method is time-consuming to achieve an ultra-smooth surface, and is easy to cause surface and sub-surface defects, resulting in a significant reduction in the surface damage threshold of the fused silica.
Click here for original story, Researchers achieve fused silica with high damage threshold by combing chemical etching and laser polishing
Source: Phys.org