Surface modification of micro-nanoparticles at the atomic and close-to-atomic scales is of great importance to their applications in a variety of fields, such as energy storage, catalysis, sensors, and biomedicine. In order to meet the industry requirements in these areas, it is urgently necessary to develop high-volume manufacturing of atomically precise coatings on particulate materials. As an advanced extreme manufacturing method, atomic layer deposition (ALD) is a thin film deposition method which offers pinhole-free films with precise thickness control at the angstrom level and exceptional homogeneity on complex structures. Fluidized bed ALD (FB-ALD) has shown great potential in atomically ultrathin films on large amounts of particles.
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Source: Phys.org