Since the scientists at Bell Labs invented the world’s first transistor in December 1947, a revolution in microelectronics technology has profoundly affected lifestyles worldwide. As electronics get smaller and smaller, it is a challenge to find an easy, fast, and low-cost way to fabricate micro-nano components. Traditional direct writing fabrication methods such as mechanical scribing, focused ion beam etching, electron beam lithography, multiphoton polymerization, and thermal scanning probe etching are inefficient.
Click here for original story, Impact of film thickness in laser-induced periodic structures on amorphous Si films
Source: Phys.org