Transition metal silicides, a distinct class of semiconducting materials that contain silicon, demonstrate superior oxidation resistance, high temperature stability and low corrosion rates, which make them promising for a variety of future developments in electronic devices. Despite their relevance to modern technology, however, fundamental aspects of the chemical bonding between their transition metal atoms and silicon remain poorly understood. One of the most important, but poorly known, properties is the strength of these chemical bonds—the thermochemical bond dissociation energy.