Graphene is one of the most promising materials for advanced electronics due to its extraordinary chemical and physical properties. The interaction between the graphene lattice and light opens the way for the development of novel devices with superior functionality. Nevertheless, technology used for traditional silicon electronics is unlikely suitable for graphene. Photolithography is the main process in semiconductor production, using polymers and liquids that can drastically alter the initial properties of graphene. The novel maskless methods are in active development in graphene technology.