Thin films play a key role in the production of electronics. They can be grown directly on a substrate surface through the chemical vapor deposition (CVD) process, which involves a reaction of vapor phase precursor compounds. Based on in situ Raman spectroscopy during simulated CVD in a customized reactor, the decomposition of a tungsten carbonitride precursor was examined under realistic conditions. In the European Journal of Inorganic Chemistry, researchers have proposed a decomposition mechanism.
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Source: Phys.org