New microscopy under ambient achieves less than 10 nm spatial resolution on surface potential measurement

A new nanomaterials microscopy approach called Pulsed Force Kelvin Probe Force Microscopy (PF-KPFM), allows for less than 10 nanometer measurements of work function and surface potential in a single-pass AFM scan. The findings have been published in two related articles in ACS Nano and Angewandte Chemie International Edition.


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Source: Phys.org