Defect inspection scientists from Huazhong University of Science and Technology, Harbin Institute of Technology and The Chinese University of Hong Kong make a thorough review of new perspectives and exciting trends on the foundation of former great reviews in the field of defect inspection methods. The review focuses on three specific areas: (1) the defect detectability evaluation, (2) the diverse optical inspection systems, and (3) the post-processing algorithms.
Click here for original story, Optical wafer defect inspection at the 10 nm technology node and beyond
Source: Phys.org